INFLUENCE OF PREPARATION CONDITIONS ON PHOTO-STRUCTURAL AND THERMO-STRUCTURAL CHANGES OF ASXS1-X FILMS

Citation
V. Mikla et al., INFLUENCE OF PREPARATION CONDITIONS ON PHOTO-STRUCTURAL AND THERMO-STRUCTURAL CHANGES OF ASXS1-X FILMS, Materials science & engineering. B, Solid-state materials for advanced technology, 38(1-2), 1996, pp. 122-126
Citations number
21
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
38
Issue
1-2
Year of publication
1996
Pages
122 - 126
Database
ISI
SICI code
0921-5107(1996)38:1-2<122:IOPCOP>2.0.ZU;2-C
Abstract
Photo- and thermo-structural changes occuring in vacuum-deposited amor phous chalcogenide films prepared by different methods have been inves tigated using Raman scattering. The changes in the Raman spectra of co nventionally prepared amorphous As2S3 films after: light treatment are interpreted in terms of rearrangement of bonding configurations of mo lecular species that exist just after evaporation. As the evaporation temperature or deposition rate is increased, heat or light treatment i nduces the formation of microcrystallites. The reversible photo-induce d changes in well-annealed films involve a vanishingly small change in bonding statistics. The most significant photostructural change occur s in the medium-range order.