STUDIES OF THE INITIAL-STAGES OF LIQUID-PHASE EPITAXY GROWTH OF INGAAS ON GAAS

Citation
R. Jothilingam et R. Dhanasekaran, STUDIES OF THE INITIAL-STAGES OF LIQUID-PHASE EPITAXY GROWTH OF INGAAS ON GAAS, Materials science & engineering. B, Solid-state materials for advanced technology, 38(1-2), 1996, pp. 186-193
Citations number
36
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
38
Issue
1-2
Year of publication
1996
Pages
186 - 193
Database
ISI
SICI code
0921-5107(1996)38:1-2<186:SOTIOL>2.0.ZU;2-7
Abstract
A theoretical analysis of the nucleation kinetics of liquid phase epit axial (LPE) growth of InGaAs on GaAs was conducted using classical het erogeneous nucleation theory incorporating the lattice mismatch betwee n the alloy and the substrate. Non-equilibrium contact between the InG aAs ternary saturated liquid and GaAs substrate under isothermal condi tions was considered. The explicit expression for lattice mismatch ind uced supercooling for growth of the chosen system was established and used for evaluation of the nucleation parameters. It is proved theoret ically that the nucleation barrier for the formation of InyGa1-yAs on GaAs depends very strongly on the composition of the alloy. The condit ions for the growth of good quality InGaAs on GaAs and shown theoretic ally and these results are compared with experimental values.