FEMTOSECOND DEPHASING IN POROUS SILICON

Citation
R. Tomasiunas et al., FEMTOSECOND DEPHASING IN POROUS SILICON, Applied physics letters, 68(23), 1996, pp. 3296-3298
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
23
Year of publication
1996
Pages
3296 - 3298
Database
ISI
SICI code
0003-6951(1996)68:23<3296:FDIPS>2.0.ZU;2-B
Abstract
We determine dephasing times T-2 in free standing porous silicon sampl es using nondegenerate four-wave mixing. Within the framework of an id ealized inhomogeneously broadened two-level system, values of 20 fs fo r different porosities are obtained. Fast energy relaxation times are found in the range of 1.5-3.5 ps for 64%-73% porosities. respectively. They are attributed to carrier thermalization within the band tails, originating from porous silicon nanocrystallites and their surface sta irs. (C) 1996 American Institute of Physics.