FABRICATION AND CHARACTERIZATION OF SPUTTERED-CARBON MICROELECTRODE ARRAYS

This paper describes a robust and reliable process for fabricating a n ovel sputter-deposited, thin-film carbon microelectrode array using st andard integrated circuit technologies and silicon micromachining. Spu tter-deposited carbon films were investigated as potential candidates for microelectrode materials. The surface properties and cross section of the microelectrode arrays were studied by atomic force microscopy and scanning electron microscopy, respectively. Electrical site impeda nce, crosstalk, and lifetime (dielectric integrity) of microelectrodes in the array were characterized. Electrochemical response of the micr oelectrodes to hexaammineruthenium(III) chloride and dopamine were inv estigated by fast-scan cyclic voltammetry and high-speed, computer-bas ed chronoamperometry; results show that thin-film carbon microelectrod es are well-behaved electrochemically. The thin carbon films offer ext remely good electrical, mechanical, and chemical properties and thus q ualify as viable candidates for various electroanalytical applications , particularly acute neurophysiological studies.