Wc. Liu et al., PERPENDICULAR TRANSPORT-PROPERTIES OF A P-GAAS DELTA-DOPED SUPERLATTICE/N+-GAAS STRUCTURE/, IEE proceedings. Part G. Circuits, devices and systems, 140(2), 1993, pp. 81-84
The perpendicular transport properties of a p-GaAs/delta-doped superla
ttice/n+-GaAs structure were studied at 300 and 77 K. An interesting S
-shaped negative differential resistance (NDR), resulting mainly from
avalanche multiplications within the superlattice region, was observed
at 300 K. A different multistate NDR phenomenon and an interesting hy
steresis behaviour were found at 77 K. The multistate NDR is attribute
d to a sequential subavalanche multiplication process occurring within
superlattice periods; holes created by avalanche multiplications play
an important role in the transport properties. The hysteresis behavio
ur at 77 K seems to be caused by the heavily accumulated holes, which
cannot react synchronously with the applied electric field.