S. Parhofer et al., GROWTH-CHARACTERISTICS AND MAGNETIC-PROPERTIES OF SPUTTERED ND-FE-B THIN-FILMS, Journal of magnetism and magnetic materials, 163(1-2), 1996, pp. 32-38
Thin Nd-Fe-B films (200 to 2000 nm) with good hard magnetic properties
have been produced bl magnetron sputtering in UHV. We have investigat
ed the influence of substrate temperature and sputtering gas pressure
on the structural and magnetic properties of the films. It was found t
hat the composition of the films strongly depends on the argon pressur
e. This gives us the possibility to vary the Nd content in the range o
f 13 to 32 at%. Highly textured films can be produced at low gas press
ure (0.03 mbar) and low substrate temperatures (approximate to 675 K).
Thee films exhibit a low coercivity (100 to 300 kA/m) and low remanen
ce, but have a high saturation polarization of about 1.5 T, measured v
ertical to the film plane. High coercive films (H-cj = 800-1200 kA/m)
with a remanence of about 1.05 T can be achieved through sputtering at
high argon pressures (0.1 to 0.2 mbar) and a substrate temperature in
the range of 800 to 900 K.