OPTIMIZATION OF X-RAY SOURCES FOR PROXIMITY LITHOGRAPHY PRODUCED BY AHIGH AVERAGE POWER ND-GLASS LASER

Citation
P. Celliers et al., OPTIMIZATION OF X-RAY SOURCES FOR PROXIMITY LITHOGRAPHY PRODUCED BY AHIGH AVERAGE POWER ND-GLASS LASER, Journal of applied physics, 79(11), 1996, pp. 8258-8268
Citations number
27
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
11
Year of publication
1996
Pages
8258 - 8268
Database
ISI
SICI code
0021-8979(1996)79:11<8258:OOXSFP>2.0.ZU;2-Z
Abstract
We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of d elivering 13 ns full width at half-maximum pulses at up to 20 J at 1.0 53 mu m and 12 J at 0.53 mu m. Targets were chosen to optimize emissio n in the 10-15 Angstrom wavelength band, including L-shell emission fr om materials with atomic numbers in the range Z=24-30 and M-shell emis sion from Xe (Z=54). With 1.053 mu m a maximum conversion of 11% into 2 pi sr was measured from solid Xe targets. At 0.527 mu m efficiencies of 12%-18%/(2 pi sr) were measured for all of the solid targets in th e same wavelength band. The x-ray conversion efficiency from the Xe ga s puff target was considerably lower, at about 3%/(2 pi sr) when irrad iated with 1.053 mu m. (C) 1996 American Institute of Physics.