SURFACE PHOTOVOLTAGE SPECTROSCOPY OF THIN-FILMS

Citation
M. Leibovitch et al., SURFACE PHOTOVOLTAGE SPECTROSCOPY OF THIN-FILMS, Journal of applied physics, 79(11), 1996, pp. 8549-8556
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
11
Year of publication
1996
Pages
8549 - 8556
Database
ISI
SICI code
0021-8979(1996)79:11<8549:SPSOT>2.0.ZU;2-R
Abstract
The surface photovoltage (SPV) spectrum due to subband-gap illuminatio n of thin films is theoretically studied. It is shown that this SPV is inherently sensitive to buried interfaces just as it is sensitive to the external semiconductor surface. The different contributions to the SPV from all the optically active gap states present within a sample, consisting of a bulk substrate covered by a thin film, are analyzed. Analytical expressions are obtained in the low illumination intensity and the depletion approximation regime. The evolution of the SPV spect rum with film thickness is examined and is found to depend on both sit e and population of the gap states. Three modes of evolution are found , according to the relative importance of gap state population changes with film thickness. These modes are confirmed by a numerical simulat ion of a thin film of pseudomorphic InAlAs on InP substrates and by ex periments conducted on the same system. The approach is also applied t o the InP/In2O3 system, revealing gap state formation, followed by fil ling with electrons, thereby explaining previous observations of nearl y ideal I-V behavior at this junction. (C) 1996 American Institute of Physics.