OPTICAL-PROPERTIES OF BORON-CARBIDE (B5C) THIN-FILMS FABRICATED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

Citation
Aa. Ahmad et al., OPTICAL-PROPERTIES OF BORON-CARBIDE (B5C) THIN-FILMS FABRICATED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 79(11), 1996, pp. 8643-8647
Citations number
33
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
11
Year of publication
1996
Pages
8643 - 8647
Database
ISI
SICI code
0021-8979(1996)79:11<8643:OOB(TF>2.0.ZU;2-G
Abstract
Variable angle of incidence spectroscopic ellipsometry was used to det ermine the optical constants near the band edge of boron carbide (B5C) thin films deposited on glass and n-type Si(111) via plasma-enhanced chemical-vapor deposition. The index of refraction n, the extinction c oefficient k, and the absorption coefficient are reported in the photo n energy spectrum between 1.24 and 4 eV. Ellipsometry analysis of B5C films on silicon indicates a graded material, while the optical consta nts of B5C on glass are homogeneous. Line shape analyses of absorption data for the films on glass indicate an indirect transition at approx imately 0.75 eV and a direct transition at about 1.5 eV. (C) 1996 Amer ican Institute of Physics.