Group IV semiconductor alloy systems offer promise as variable band ga
p alloys compatible with Si technology. Binary, ternary, and quaternar
y group IV alloys were grown by molecular beam epitaxy on Si substrate
s. The fundamental absorption edge was measured by Fourier transform i
nfrared spectroscopy to obtain the optical band gap of the alloys, and
the position of the fundamental absorption edge was observed to depen
d on the experimentally measured alloy composition. Our results indica
te a variety of Si-rich group IV alloys with various band gaps are exp
erimentally producible. (C) 1996 American Institute of Physics.