Y. Kiyozumi et al., CRYSTAL-GROWTH OF HIGH-SILICA ZSM-5 AT LOW-TEMPERATURE SYNTHESIS CONDITIONS, The Korean journal of chemical engineering, 13(2), 1996, pp. 144-149
At the temperature of 90 degrees C and under atmospheric pressure, gro
wth kinetics of high silica ZSM-5 was investigated through a long indu
ction, nucleation and crystal growth periods. It was found the entire
crystallization mechanism of ZSM-5 seems to be the combined process of
the nucleation via solid-solid transformation, intergrowth among seed
crystals and the normal growth in the reaction mixture. Nuclei were i
nitially formed on the Si-rich surface of the amorphous intermediates,
indicating that the reaction of TPA with Si species was prior to that
with Al species. As the reaction time proceeded, various types of int
ergrowth among the seed crystals were observed along with the crystals
growing independently. The intergrowth seems to play a role for formi
ng typical ZSM-5 crystal shapes. And then ZSM-5 crystals further grew
in the reaction mixture, so that the bulk Si/Al-2 ratio of crystals ap
proached that of the initial reaction mixture.