SURFACE PROCESSES AT ELECTROLYTE HIGHLY DOPED SEMICONDUCTOR INTERFACES ANALYZED BY ELECTROREFLECTANCE MODELING

Citation
Jma. Gilman et al., SURFACE PROCESSES AT ELECTROLYTE HIGHLY DOPED SEMICONDUCTOR INTERFACES ANALYZED BY ELECTROREFLECTANCE MODELING, Journal of the Chemical Society. Faraday transactions, 89(11), 1993, pp. 1717-1722
Citations number
23
Categorie Soggetti
Chemistry Physical","Physics, Atomic, Molecular & Chemical
ISSN journal
09565000
Volume
89
Issue
11
Year of publication
1993
Pages
1717 - 1722
Database
ISI
SICI code
0956-5000(1993)89:11<1717:SPAEHD>2.0.ZU;2-H
Abstract
Electroreflectance spectra from a highly doped n-GaAs sample in an alk aline electrolyte have been modelled, taking into account both Franz-K eldysh and bandfilling (Moss-Burstein) effects. Comparisons are made b etween theory and experiment, and the evolution of spectra calculated for a wide range of space-charge potentials is found to follow accurat ely that of the experimental spectra with applied potential. The propo rtion of the interfacial a.c. and d.c. potential differences accommoda ted outside the semiconductor can also be obtained from the analysis, allowing us to extract the Fermi level pinning and to associate this w ith possible surface chemical reactions. The importance of heavy-dopin g effects is also briefly discussed, and the inclusion of band-filling in the modelling of the electroreflectance spectra of highly doped n- GaAs is shown to be essential if a quantitative fit is to be obtained.