ROLE OF SURFACE-DIFFUSION PROCESSES DURING BIAS-ENHANCED NUCLEATION OF DIAMOND ON SI

Citation
J. Gerber et al., ROLE OF SURFACE-DIFFUSION PROCESSES DURING BIAS-ENHANCED NUCLEATION OF DIAMOND ON SI, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 261-265
Citations number
27
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
5
Issue
3-5
Year of publication
1996
Pages
261 - 265
Database
ISI
SICI code
0925-9635(1996)5:3-5<261:ROSPDB>2.0.ZU;2-B
Abstract
We show that the ion flux of energetic ions is the critical factor for the bias enhancement of the nucleation density of diamond on silicon. The energetic ions penetrate the surface, show little migration and f orm nanocrystalline graphite. The radicals have low energies and are a dsorbed and migrate over the surface. This is confirmed by the shape o f the C hillocks formed during biasing. Diamond nucleation is believed to occur either as small diamond crystals, which have grown during bi asing, or on graphitic planes, which are oriented locally perpendicula r to the surface.