Formation of mullite on ceramic substrates via chemical vapor depositi
on was investigated. Mullite is a solid solution of Al2O3 and SiO2 wit
h a composition of 3Al(2)O(3) . 2SiO(2). Thermodynamic calculations pe
rformed on the AlCl3-SiCl4-CO2-H-2 system were used to construct equil
ibrium chemical vapor deposition (CVD) phase diagrams. With the aid of
these diagrams and consideration of kinetic rate limiting factors, in
itial process parameters were determined. Through process optimization
, crystalline CVD mullite coatings have been successfully grown on SiC
and Si3N4 substrates. Results from the thermodynamic analysis, proces
s optimization, and effect of various process parameters on deposition
rate and coating morphology are discussed.