FORMATION OF CRYSTALLINE GERMANIUM NANOCLUSTERS IN A SILICA XEROGEL MATRIX FROM AN ORGANOGERMANIUM PRECURSOR

Citation
Jp. Carpenter et al., FORMATION OF CRYSTALLINE GERMANIUM NANOCLUSTERS IN A SILICA XEROGEL MATRIX FROM AN ORGANOGERMANIUM PRECURSOR, Chemistry of materials, 8(6), 1996, pp. 1268-1274
Citations number
35
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
ISSN journal
08974756
Volume
8
Issue
6
Year of publication
1996
Pages
1268 - 1274
Database
ISI
SICI code
0897-4756(1996)8:6<1268:FOCGNI>2.0.ZU;2-M
Abstract
Addition of the organogermanium compound, Me(3)GeS(CH2)(3)Si(OMe)(3), to a modified, conventional sol-gel formulation gives a silica xerogel doped with this molecular species. Subsequent thermal treatment of th is molecularly doped xerogel under oxidizing then reducing conditions affords nanoclusters of Ge highly dispersed throughout the bulk of the xerogel matrix. Under appropriate conditions, Ge nanoclusters having an average diameter of ca. 68 Angstrom can be formed by this procedure . Characterization of this nanocomposite material by TEM, HRTEM, EDS, XRD, micro-Raman spectroscopy, electron diffraction, and UV-visible sp ectroscopy indicates that the Ge nanoclusters are highly crystalline a nd exhibit optical properties consistent with those expected when quan tum confinement effects are operative.