ELECTRICAL AND STRUCTURAL-PROPERTIES OF PTSI FILMS IN DEEP-SUBMICRON LINES

Electrical and structural properties of platinum monosilicide (PtSi) i n deep submicron lines are reported. The sheet resistance of the silic ide films was found to be rather independent of the Linewidth down to dimensions as small as 0.15 mu m. Plan-view and cross-sectional transm ission electron microscopy was performed to study the structural prope rties of three films, including their gain structures and lateral grow th. The insensitive nature of the electrical properties of the silicid e films to the linewidths is correlated with their structural properti es. (C) 1996 American Institute of Physics.