Eh. Klaassen et al., SILICON FUSION BONDING AND DEEP REACTIVE ION ETCHING - A NEW TECHNOLOGY FOR MICROSTRUCTURES, Sensors and actuators. A, Physical, 52(1-3), 1996, pp. 132-139
New developments in deep reactive ion etching (DRIE) technology, when
combined with silicon fusion bonding (SFB), make it possible, for the
first time, to span nearly the entire range of microstructure thicknes
ses between surface and bulk micromachining, using only single-crystal
silicon. The combination of these two powerful micromachining tools f
orms a versatile new technology for the fabrication of micromechanical
devices. The two techniques are described and a process technology is
presented. Some of the experimental structures and devices that have
been demonstrated using this new process technology are discussed.