SINGLE-ELECTRON TUNNELING EFFECT IN YBCO FILMS

Citation
Ji. Kye et al., SINGLE-ELECTRON TUNNELING EFFECT IN YBCO FILMS, Journal of the Korean Physical Society, 29(3), 1996, pp. 354-359
Citations number
19
Categorie Soggetti
Physics
ISSN journal
03744884
Volume
29
Issue
3
Year of publication
1996
Pages
354 - 359
Database
ISI
SICI code
0374-4884(1996)29:3<354:STEIYF>2.0.ZU;2-2
Abstract
We have measured the tunneling spectra of c-axis-oriented YBCO films p repared by the sputtering method. In some spats, the spectra show peri odic current steps at the corresponding voltages of V = (2n + 1)delta V/2 or V = n delta V, We have measured delta V with the variation of t he sample-to-tip distance. The resulting voltage period delta V = e/C increases as the sample-tu-tip distance increases. This behavior is ex plained by single electron tunneling. The simulated conductance, with the assumption of a normal state density of states for both the metal grains and the YBCO surface layer, shows a good agreement with the exp erimental result, indicating that rite surface layer of YBCO is in a n ormal state due to oxygen deficiency.