A simple instrument for automatically controlling the deposition rate
of an electron-beam evaporator is described. The design incorporates a
commercially available, microprocessor based, proportional-integral-d
ifferential process controller that provides loop control and automati
c determination of optimal proportional, integral, and differential lo
op constants. A logarithmic amplifier is used to linearize the overall
loop response. The controller is used in conjunction with a compact e
lectron-beam heated evaporator.