SUBSTRATE HEATER DESIGN FOR FILM DEPOSITION IN OXIDIZING ATMOSPHERE

Authors
PARDO F BURMEISTER G GUIMPEL J
Citation
F. Pardo et al., SUBSTRATE HEATER DESIGN FOR FILM DEPOSITION IN OXIDIZING ATMOSPHERE, Review of scientific instruments, 67(6), 1996, pp. 2370-2371
Citations number
5
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
Journal title
Review of scientific instruments → ACNP
ISSN journal
00346748
Volume
67
Issue
6
Year of publication
1996
Pages
2370 - 2371
Database
ISI
SICI code
0034-6748(1996)67:6<2370:SHDFFD>2.0.ZU;2-H
Abstract
A simple substrate heater for oxide film deposition is presented. Its main features are (a) good thermal contact between temperature sensor, heater, and substrate and (b) compatibility with oxidizing atmosphere at high temperatures. The system shows a good response for the deposi tion conditions necessary in high-T-c cuprate materials. (C) 1996 Amer ican Institute of Physics.