INITIAL-STAGES OF THE GROWTH OF FE ON SI(111)7X7

We present a multitechnique (scanning tunneling microscopy, photoelect ron spectroscopy, and ion scattering spectroscopy) approach to study t he formation of the Fe/Si(111) interface at room temperature. The firs t-deposited Fe atoms react with the surface, displacing Si atoms from their positions. The result is an amorphous layer with composition and density of states close to those of FeSi. On top of this reacted laye r, crystallites of Fe with interdiffused Si grow. Upon further Fe depo sition, the crystallite composition evolves to pure Fe.