A NOVEL TECHNIQUE FOR THE MEASUREMENT OF STRESS IN THIN METALLIC-FILMS

Citation
S. Askraba et al., A NOVEL TECHNIQUE FOR THE MEASUREMENT OF STRESS IN THIN METALLIC-FILMS, Measurement science & technology, 7(6), 1996, pp. 939-943
Citations number
17
Categorie Soggetti
Instument & Instrumentation",Engineering
ISSN journal
09570233
Volume
7
Issue
6
Year of publication
1996
Pages
939 - 943
Database
ISI
SICI code
0957-0233(1996)7:6<939:ANTFTM>2.0.ZU;2-I
Abstract
A novel interferometric method for determining mechanical stress in va cuum-deposited thin metallic layers on glass substrates is described. Stress in the glass-metal structure affects the curvature and hence th e resonant frequencies of the substrate. Thus, by measuring variations of the resonant frequencies, the curvature and hence the stress can b e determined. The technique of photo-thermoelastic bending has been ad apted to this measurement. Measuring the variation in resonant frequen cy is a very sensitive method of determining the substrate curvature. Tests of the new technique using thin Cr films on glass demonstrate it s effectiveness.