Ng. Tarr et al., SIMPLE BACKGATED MOSFET STRUCTURE FOR DYNAMIC THRESHOLD CONTROL IN FULLY DEPLETED SOI CMOS, Electronics Letters, 32(12), 1996, pp. 1093-1095
A simple junction-isolated backgate electrode, formed by boron implant
ation through the buried oxide, is shown to provide effective dynamic
control of device thresholds in fully depleted SOI CMOS for similar or
equal to 1V power supply operation.