IN-SITU DIAGNOSTICS FOR PLASMA SURFACE PROCESSING

A survey is given of in-situ diagnostic's of plasma and surface for ap plication in plasma etching and deposition. Especially those diagnosti cs that increase the fundamental understanding of the elementary proce sses occurring both within the plasma and at the surface are highlight ed. In general, diagnostics are performed to determine the value of a physical parameter. This value is fed into models of plasma or surface , and in that way the understanding of the process is enhanced. In the paper first the most interesting physical parameters are defined. Sub sequently the diagnostic techniques currently available to determine t hose parameters are reviewed.