RECOMBINATION-ENHANCED ANNEALING IN GAAS AND ALGAAS LAYERS

Citation
Mm. Sobolev et al., RECOMBINATION-ENHANCED ANNEALING IN GAAS AND ALGAAS LAYERS, Semiconductors, 30(6), 1996, pp. 587-590
Citations number
16
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
10637826
Volume
30
Issue
6
Year of publication
1996
Pages
587 - 590
Database
ISI
SICI code
1063-7826(1996)30:6<587:RAIGAA>2.0.ZU;2-Z
Abstract
Epitaxial layers of GaAs and AlGaAs grown with superhigh cooling rates have been studied by spectral measurements, using deep-level transien t spectroscopy and photoluminescence. It was found that nonequilibrium growth conditions result in the formation of defects which are charac teristic of irradiated GaAs and AlGaAs and which are associated with V -As and As (Ga) centers. After these layers were irradiated with a las er having a wavelength of lambda = 0.51 mu m, significant changes were observed in the deep-level transient spectroscopy for GaAs and AlGaAs and the photoluminescence spectra of AlGaAs. These changes are associ ated with the partial optically induced annealing of defects and with the recombination-stimulated diffusion of a donor impurity D, resultin g in the formation of a V-As-D complex. (C) 1996 American Institute of Physics.