EXPERIMENTAL RESULTS WITH SILICONIZATION IN REVERSED-FIELD PINCH DEVICES

Authors
ZHANG P LI Q LUO CW LI JP FANG SQ YI P XUE J LI KH LUO JL CAO Z HONG WY ZHANG NM WANG QM LU J HUANG M ZHONG YZ ZHANG QC LUO CX
Citation
P. Zhang et al., EXPERIMENTAL RESULTS WITH SILICONIZATION IN REVERSED-FIELD PINCH DEVICES, Chinese Physics Letters, 13(5), 1996, pp. 378-381
Citations number
7
Categorie Soggetti
Physics
Journal title
Chinese Physics Letters → ACNP
ISSN journal
0256307X
Volume
13
Issue
5
Year of publication
1996
Pages
378 - 381
Database
ISI
SICI code
0256-307X(1996)13:5<378:ERWSIR>2.0.ZU;2-9
Abstract
Reversed field pinch (RFP) and ultralow safety factor plasma experimen tal performances with pulsed discharge cleaning and siliconization on SWIP-RFP device are presented. The wall siliconization was performed b y using the device discharges. The experimental results with siliconiz ation in RFP devices showed that the impurity concentrations were decr eased in the plasma and better plasma parameters were obtained in the device.