INVESTIGATION OF ON-CHIP HIGH-TEMPERATURE ANNEALING OF PMOS DOSIMETERS

Citation
A. Kelleher et al., INVESTIGATION OF ON-CHIP HIGH-TEMPERATURE ANNEALING OF PMOS DOSIMETERS, IEEE transactions on nuclear science, 43(3), 1996, pp. 997-1001
Citations number
6
Categorie Soggetti
Nuclear Sciences & Tecnology","Engineering, Eletrical & Electronic
ISSN journal
00189499
Volume
43
Issue
3
Year of publication
1996
Part
1
Pages
997 - 1001
Database
ISI
SICI code
0018-9499(1996)43:3<997:IOOHAO>2.0.ZU;2-H
Abstract
Radiation sensitive pMOS dosimeters can measure only to a maximum dose which is determined by the type, sensitivity and irradiation conditio ns of the RADFET. On reaching the maximum dose, the dosimeters normall y have to be replaced. The aim of this work is to study the feasibilit y of using on-chip poly-resistor heaters to anneal the dosimeters back to their pre-irradiation threshold voltage. This study shows that on- chip heating is a viable option to achieve post-irradiation annealing, and that the fading characteristics obtained agree with those of oven annealing from a previous study which was carried out on the NMRC RAD FETs.