EFFECTS RELATED TO DOSE DEPOSITION PROFILES IN INTEGRATED-OPTICS STRUCTURES

Authors
WEST RH DOWLING S
Citation
Rh. West et S. Dowling, EFFECTS RELATED TO DOSE DEPOSITION PROFILES IN INTEGRATED-OPTICS STRUCTURES, IEEE transactions on nuclear science, 43(3), 1996, pp. 1044-1049
Citations number
8
Categorie Soggetti
Nuclear Sciences & Tecnology","Engineering, Eletrical & Electronic
Journal title
IEEE transactions on nuclear science → ACNP
ISSN journal
00189499
Volume
43
Issue
3
Year of publication
1996
Part
1
Pages
1044 - 1049
Database
ISI
SICI code
0018-9499(1996)43:3<1044:ERTDDP>2.0.ZU;2-S
Abstract
Results from exposures of lithium tantalate and lithium niobate integr ated optic structures to pulses of high energy X-rays and fast electro ns are related to dose and charge deposition profiles. Anomalous effec ts in the tantalate are ascribed to induced electric fields.