ATOMIC-FORCE MICROSCOPY OBSERVATION OF THE FIRST STAGES OF DIAMOND GROWTH ON SILICON

The first stages of diamond growth on scratched silicon substrates wer e studied by atomic force microscopy (AFM). Samples were obtained by b oth hot filament and microwave plasma CVD methods at short deposition times prior to coalescence. it was observed that, after an incubation time, diamond nanocrystals nucleated onto the scratches produced by di amond paste polishing. The Raman spectra of the crystals showed differ ent bands associated with several carbon phases. Simultaneous with dia mond growth, we detected an etching effect of the silicon surface attr ibuted to the atomic hydrogen present in the activated gas.