ELECTRON-EMISSION MEASUREMENTS FROM CVD DIAMOND SURFACES

Citation
Sp. Bozeman et al., ELECTRON-EMISSION MEASUREMENTS FROM CVD DIAMOND SURFACES, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 802-806
Citations number
16
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
5
Issue
6-8
Year of publication
1996
Pages
802 - 806
Database
ISI
SICI code
0925-9635(1996)5:6-8<802:EMFCDS>2.0.ZU;2-#
Abstract
Electron emission measurements on diamond films synthesized by chemica l vapor deposition are reported. UV photoemission spectroscopy indicat es that the samples exhibit a negative electron affinity after exposur e to hydrogen plasma. Secondary electron emission yields vary from 2.2 to 9.2. Field emission current-voltage measurements indicate threshol d voltages ranging from 28 to 84 V mu m(-1). The film with the highest secondary yield also exhibits the lowest emission threshold.