PHOTOACOUSTIC THERMAL CHARACTERIZATION OF SPARK-PROCESSED POROUS SILICON

A non-separation approach to determine the spark-processed porous sili con thermal parameters is presented. This thermal characterization was performed through application of the photoacoustic technique, in comb ination with compositional models for spark-processed porous silicon s amples, The thermal parameters obtained are in agreement with existing studies about the composition of this material. This approach opens t he possibility of performing the thermal characterization of other por ous semiconductors and analogous materials. (C) 1996 American Institut e of Physics.