LOCAL-FIELD AND POTENTIAL BARRIER IN TUNNELING PROCESSES

Authors
MOLLICONE MM DACAL LCO DECASTILHO CMC
Citation
Mm. Mollicone et al., LOCAL-FIELD AND POTENTIAL BARRIER IN TUNNELING PROCESSES, Applied surface science, 94-5, 1996, pp. 68-72
Citations number
15
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
94-5
Year of publication
1996
Pages
68 - 72
Database
ISI
SICI code
0169-4332(1996)94-5:<68:LAPBIT>2.0.ZU;2-6
Abstract
Ionisation rate-constants in conditions of imaging processes in field ion microscopy are calculated by considering a local electric field th at varies along the potential barrier. The results are then compared w ith previous calculations where the field along the barrier is taken a s constant.