Zp. Shi et al., DIMER SHEARING AS A NOVEL MECHANISM FOR CLUSTER DIFFUSION AND DISSOCIATION ON METAL (100) SURFACES, Physical review letters, 76(26), 1996, pp. 4927-4930
Using bond-counting arguments and embedded-atom calculations, we estab
lish the crucial importance of dimer shearing in metal (100) submonola
yer epitaxy. This process provides the easiest pathway for diffusion o
f compact clusters of sizes 4, 6, and 8, and introduces a rich variety
of localized cluster dynamics.-A combination of the dimer shear motio
n and the traditional mechanism of sequential motion of individual ato
ms provides a better interpretation of the oscillatory behavior of clu
ster mobility with cluster size. This combination also defines a new s
et of critical cluster sizes that are likely to be selected in epitaxi
al growth.