THIN-FILM GROWTH OF THE CHARGE-DENSITY-WAVE OXIDE RB0.30MOO3

Citation
Hsj. Vanderzant et al., THIN-FILM GROWTH OF THE CHARGE-DENSITY-WAVE OXIDE RB0.30MOO3, Applied physics letters, 68(26), 1996, pp. 3823-3825
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
26
Year of publication
1996
Pages
3823 - 3825
Database
ISI
SICI code
0003-6951(1996)68:26<3823:TGOTCO>2.0.ZU;2-J
Abstract
We report on the thin-film fabrication of a charge-density wave (CDW) compound. Single-phase epitaxial films of the model CDW oxide Rb0.30Mo O3 have been grown by pulsed-laser deposition. Detailed analyses show that the Rb0.30MoO3 films have mu m-size grains with the CDW chains or iented parallel to the substrate. On SrTiO3 (510), the CDW chains alig n into a single direction within the him plane, The electrical resista nce of the films demonstrates a CDW state below about 182 K. Structure s patterned in films will permit unprecedented studies of phase-cohere nt CDW transport, as well as the exploration of devices based on CDWs. (C) 1996 American Institute of Physics.