INFLUENCE OF AR ION ETCHING ON T-C OF LIQUID-QUENCHED BI1.6PB0.4SR2CA2CU3OX SUPERCONDUCTOR BY SHEET PLASMA SOURCE

Authors
NISHI Y ISHII H SAKAMOTO K OGURI K MATSUMOTO H TONEGAWA A TAKAYAMA K
Citation
Y. Nishi et al., INFLUENCE OF AR ION ETCHING ON T-C OF LIQUID-QUENCHED BI1.6PB0.4SR2CA2CU3OX SUPERCONDUCTOR BY SHEET PLASMA SOURCE, Journal of Materials Science, 31(11), 1996, pp. 2893-2896
Citations number
12
Categorie Soggetti
Material Science
Journal title
Journal of Materials Science → ACNP
ISSN journal
00222461
Volume
31
Issue
11
Year of publication
1996
Pages
2893 - 2896
Database
ISI
SICI code
0022-2461(1996)31:11<2893:IOAIEO>2.0.ZU;2-6
Abstract
The influence of argon-ion etching is investigated for liquid-quenched high-T-c Bi1.6Pb0.4Sr2Ca2Cu3Ox. The argon-ion irradiation has no effe ct on the T-c value for a dose of 4.05 x 10(17) (ions mm(-2)). However , doses in excess of this level greatly decreases the T-c value. There fore, a critical irradiation does value (D-c) to maintain a T-c value above 100 K is defined and determined. The D-c is about 4.94 x 10(17) (ions mm(-2)) for argon-ion irradiation at the low acceleration energy of 1 keV.