SIMPLE MULTIWAVELENGTH DEVICE FABRICATION TECHNIQUE USING A SINGLE-GRATING HOLOGRAPHIC EXPOSURE

A simple technique, using a single-grating holographic exposure associ ated with localized selective etching steps, has been developed for mu ltiwavelength device fabrication, four-wavelength DBR laser arrays wit h a 5 nm Bragg wavelength spacing have been fabricated for wavelength division multiplexing (WDM) applications with this method, These devic es exhibit uniformly low-threshold currents (10-15 mA), high-output po wers (15 mW) and wide tunabilities (12 nm), leading to an overall acce ssible wavelength domain of 28 nm for the array.