VERTICAL THIN-FILM-EDGE FIELD EMITTERS - FABRICATION BY CHEMICAL BEAMDEPOSITION, IMAGING OF CATHODOLUMINESCENCE AND CHARACTERIZATION OF EMISSION

We report the first fabrication of ungated vertical thin-film-edge fie ld emitters using chemical beam deposition techniques, and the first m easurement of field electron emission from arrays of such emitters. Th e deposition method has been shown to result in optimal material and s tructural film properties which are required for low voltage operation of thin-film-edge field emitters. These characteristics include an ex tremely small grain size, low stress, high purity, uniform thickness a nd a vertical geometry. We have imaged well-resolved emission patterns by cathodoluminescence using the field-emitted electrons, and have me asured well-behaved Fowler-Nordheim current-voltage characteristics. O ther advantages, such as robustness and inexpensive manufacturing, are also discussed.