VACUUM VAPOR-DEPOSITION OF PHTHALIMIDE AND PHTHALANHYDRIDE DERIVATIVES ON THE SUBSTRATES COVERED WITH MONOLAYER FILMS

Citation
Gk. Zhavnerko et al., VACUUM VAPOR-DEPOSITION OF PHTHALIMIDE AND PHTHALANHYDRIDE DERIVATIVES ON THE SUBSTRATES COVERED WITH MONOLAYER FILMS, Thin solid films, 286(1-2), 1996, pp. 227-231
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
286
Issue
1-2
Year of publication
1996
Pages
227 - 231
Database
ISI
SICI code
0040-6090(1996)286:1-2<227:VVOPAP>2.0.ZU;2-A
Abstract
The 3-morpholinylphthalimide and phthalanhydride derivative films depo sited on hydrophobic substrates or substrates covered with Langmuir-Bl odgett (LB) films have been investigated by linear dichroism measureme nts, X-ray diffraction, and electron microscopy methods. The structure and quality of the films depend on the deposited compound structure, the deposition rate and on the substrate temperature. Amorphous and po lycrystalline films of the substances investigated were found to be fo rmed both on the hydrophobic and LB film covered substrates at a room temperature. When the substrate temperature was raised to 323 K 4-(4-m orpholinyl)-7-phenyl-1,3-isobenzofurandione only tends to grow with pr eferably orientation on the LB film of the mixture of rpholinyl)-2-oct adecyl-1H-isoindole-1,3-(2H)-dione and the stearic acid covered substr ate.