A. Malaurie et A. Bessaudou, NUMERICAL-SIMULATION OF THE CHARACTERISTICS OF THE DIFFERENT METALLICSPECIES FALLING ON THE GROWING FILM IN DC MAGNETRON SPUTTERING, Thin solid films, 286(1-2), 1996, pp. 305-316
In this work, we consider the d.c. magnetron sputtering process and we
present a Monte Carlo computation of the transport phenomena of the s
puttered atoms through the background gas. The atoms are ejected with
a cosine or a subcosine (fitted by an elliptical form function) and un
dergo many collisions with the background gas atoms. The collisions ar
e simulated with an interactive Born-Mayer potential or lead to an ale
atory deviation. The model allows one to obtain theoretical thicknesse
s everywhere on the walls of the chamber. To validate our model we hav
e compared these results with experimental thickness repartitions obta
ined for sputtering of aluminium, copper and titanium. Our results are
in a good agreement with these experimental results. Afterwards, we h
ave used the model to obtain physical values such as energy distributi
on and mean energy of the impinging atoms. The case of binary alloyed
target (aluminium-titanium) sputtering has been considered too. We hav
e calculated the composition of the alloyed coating on the walls of th
e chamber and the results are compared with experimental values.