NUMERICAL-SIMULATION OF THE CHARACTERISTICS OF THE DIFFERENT METALLICSPECIES FALLING ON THE GROWING FILM IN DC MAGNETRON SPUTTERING

In this work, we consider the d.c. magnetron sputtering process and we present a Monte Carlo computation of the transport phenomena of the s puttered atoms through the background gas. The atoms are ejected with a cosine or a subcosine (fitted by an elliptical form function) and un dergo many collisions with the background gas atoms. The collisions ar e simulated with an interactive Born-Mayer potential or lead to an ale atory deviation. The model allows one to obtain theoretical thicknesse s everywhere on the walls of the chamber. To validate our model we hav e compared these results with experimental thickness repartitions obta ined for sputtering of aluminium, copper and titanium. Our results are in a good agreement with these experimental results. Afterwards, we h ave used the model to obtain physical values such as energy distributi on and mean energy of the impinging atoms. The case of binary alloyed target (aluminium-titanium) sputtering has been considered too. We hav e calculated the composition of the alloyed coating on the walls of th e chamber and the results are compared with experimental values.