RH PARTICLE GROWTH ON INSULATOR SUBSTRATES - RHEED STUDY

Three-dimensional Rh particle catalysts were prepared by heteroepitaxi al growth on alpha-Al2O3 (0001),NaCl (001) and KCl (001) substrates. D uring the deposition, the particle structure and orientation were char acterised by Reflection High Energy Electron Diffraction (RHEED). It w as shown that ar sufficiently high temperatures the Rh particles conse rve the symmetry of tile substrate (hexagonal in the case of alpha-Al2 O3 (0001) and cubic for (001) NaCl and (001) KCl substrates). Ar lower temperatures the layers are disordered or partially disordered.