B. Demeulenaer et al., REFLECTION PHENOMENA IN PARTICLE SIZING BY STATIC AND DYNAMIC LIGHT-SCATTERING, Particle & particle systems characterization, 13(2), 1996, pp. 130-136
Citations number
17
Categorie Soggetti
Materials Science, Characterization & Testing","Engineering, Chemical
Using a monodisperse poly(methyl methacrylate) dispersion it was shown
that light reflection at the sample cuvette walls may greatly influen
ce the results of both static (SLS) and dynamic (DLS) light scattering
experiments. Considering SLS, this reflection phenomenon mostly cause
s an overestimation of the scattered intensity at high scattering angl
es, which may give rise to the emergence of an additional, artificial
peak in the lower region of the particle size distribution. On the oth
er hand, the influence of reflection on DLS experiments was shown to b
e particularly important in the upper region of the particle size dist
ribution. The experimentally observed phenomena were explained from ba
sic principles of both particle sizing methods. Finally, it was shown
that the disturbing effect of reflection could be avoided by modifying
either the hardware or the software of the SLS and DLS techniques.