ELECTROMAGNETIC STUDY OF A PHOTOLITHOGRAPHY SETUP FOR PERIODIC MASKS AND APPLICATION TO NONPERIODIC MASKS

Citation
F. Montiel et M. Neviere, ELECTROMAGNETIC STUDY OF A PHOTOLITHOGRAPHY SETUP FOR PERIODIC MASKS AND APPLICATION TO NONPERIODIC MASKS, Journal of the Optical Society of America. A, Optics, image science,and vision., 13(7), 1996, pp. 1429-1438
Citations number
11
Categorie Soggetti
Optics
ISSN journal
10847529
Volume
13
Issue
7
Year of publication
1996
Pages
1429 - 1438
Database
ISI
SICI code
1084-7529(1996)13:7<1429:ESOAPS>2.0.ZU;2-T
Abstract
We develop a rigorous electromagnetic analysis to study the field diff racted by a metallic or dielectric grating made of rectangular rods, l ying over a stratified media. The analysis generalizes the modal theor y of perfectly conducting lamellar gratings combined with the R-matrix propagation algorithm in order to avoid numerical instabilities, thus allowing treatment of layers and gratings of arbitrary thickness. We then study the field map obtained under the conditions stated in a pre vious patent that described a process for casting on a support the fai thful reproduction of a mask pierced with periodically distributed sli ts. We make a systematic study of the influence of the various paramet ers (incidence, mark-space ratio, groove spacing, groove depth, polari zation, conductivity of the metal) on the field map below the mask. We discover a large tolerance over the parameters, close to the values s tated in the patent. The result is that the setup described in the pat ent valid for periodic maps can be used for duplicating nonperiodic ma sks (e.g., linear Fresnel zone plates) as well as chirped gratings or gratings with nonrectilinear grooves. (C) 1996 Optical Society of Amer ica