Optical waveguiding is demonstrated in porous silicon multilayers. Dep
th variations in porosity, and therefore refractive index, are achieve
d by switching between high and low current densities during the anodi
c etch process. Planar waveguiding has been demonstrated at lambda = 1
.28 pm. The wavelength range has been extended to the visible (lambda
= 0.6328 mu m) by oxidising the samples to produce layered porous oxid
e structures. Two-dimensional strip-loaded waveguides have been produc
ed, for both the visible and infrared, by etching into each top layer
through a pre-deposited photolithographically-defined mask.