POROUS SILICON MULTILAYER OPTICAL WAVE-GUIDES

Citation
A. Loni et al., POROUS SILICON MULTILAYER OPTICAL WAVE-GUIDES, Thin solid films, 276(1-2), 1996, pp. 143-146
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
276
Issue
1-2
Year of publication
1996
Pages
143 - 146
Database
ISI
SICI code
0040-6090(1996)276:1-2<143:PSMOW>2.0.ZU;2-I
Abstract
Optical waveguiding is demonstrated in porous silicon multilayers. Dep th variations in porosity, and therefore refractive index, are achieve d by switching between high and low current densities during the anodi c etch process. Planar waveguiding has been demonstrated at lambda = 1 .28 pm. The wavelength range has been extended to the visible (lambda = 0.6328 mu m) by oxidising the samples to produce layered porous oxid e structures. Two-dimensional strip-loaded waveguides have been produc ed, for both the visible and infrared, by etching into each top layer through a pre-deposited photolithographically-defined mask.