A. Diligenti et al., ELECTRICAL CHARACTERIZATION OF METAL SCHOTTKY CONTACTS ON LUMINESCENTPOROUS SILICON, Thin solid films, 276(1-2), 1996, pp. 179-182
Metal contacts have been deposited on porous silicon obtained from n e
pitaxial layers and from n(+) substrates. The optical properties of th
e material have been verified. The current-voltage (I-V) characteristi
cs of the metal/porous silicon/crystalline silicon structures are poor
ly reproducible from sample to sample, even in the case of the same fa
brication process, A common trend was observed in the semilog I-V plan
e, that is a change of the slope d(lnI)/dV which occurred for forward
voltages of about 0.5 V. Instabilities and current degradation effects
have been observed in the forward current at room temperature. I-V me
asurements on annealed Schottky contacts and free-standing layers indi
cate that the metal-porous silicon barrier plays a significant role in
the transport mechanisms.