INFLUENCE OF PHOTOLUMINESCENCE AND TRAPPING ON THE PHOTOVOLTAGE AT THE POR-SI P-SI STRUCTURE/

Citation
Vy. Timoshenko et al., INFLUENCE OF PHOTOLUMINESCENCE AND TRAPPING ON THE PHOTOVOLTAGE AT THE POR-SI P-SI STRUCTURE/, Thin solid films, 276(1-2), 1996, pp. 216-218
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
276
Issue
1-2
Year of publication
1996
Pages
216 - 218
Database
ISI
SICI code
0040-6090(1996)276:1-2<216:IOPATO>2.0.ZU;2-5
Abstract
The influence of photoluminescence (PL) and trapping on photovoltage ( PV) transients has been compared for as-anodized and for oxidized in a ir por-Si/p-Si structures. Measurements were carried out with time-res olved surface photovoltage and with contact potential difference techn iques. Light sources with wavelengths from the infrared to the ultravi olet regions were used for excitation. It was shown that PV based on P L light can be used for the estimation of the PL efficiency. Electron trapping was found to modify the band bending at the por-Si/p-Si inter face of the oxidized in air sample. Further it was shown that non-mono tonous PV transient features took place on oxidized por-Si/p-Si struct ures at high levels of optical excitation.