ABOUT THE ORIGIN AND THE MECHANISMS INVOLVED IN THE CRACKING OF HIGHLY POROUS SILICON LAYERS UNDER CAPILLARY STRESSES

Citation
O. Belmont et al., ABOUT THE ORIGIN AND THE MECHANISMS INVOLVED IN THE CRACKING OF HIGHLY POROUS SILICON LAYERS UNDER CAPILLARY STRESSES, Thin solid films, 276(1-2), 1996, pp. 219-222
Citations number
19
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
276
Issue
1-2
Year of publication
1996
Pages
219 - 222
Database
ISI
SICI code
0040-6090(1996)276:1-2<219:ATOATM>2.0.ZU;2-2
Abstract
The effects of the capillary stresses during the drying of p + -type p orous silicon (PS) layers are reported. The cracking of the PS layers occurs for samples thicker than a critical thickness value h(c). Takin g into account the elastic properties ofp + -type PS material, a simpl e model shows that h(c) varies as (1 - p)(3) and 1/gamma(LV)(2), where p is the porosity and gamma(LV) is the surface tension of the drying liquid. A good agreement with experimental results is observed. This s tudy leads also to a very easy and simple method which increases the h (c) value by a factor of about 25 when using pentane as the drying liq uid (instead of water).