THE C-AXIS RESISTIVITY FOR 2 HOPG-BASED, FIRST STAGE CUAL2CL8 AND 2NDSTAGE CUCL2-GRAPHITE INTERCALATION COMPOUNDS AS A FUNCTION OF BOTH PRESSURE AND TEMPERATURE

Citation
Oe. Andersson et al., THE C-AXIS RESISTIVITY FOR 2 HOPG-BASED, FIRST STAGE CUAL2CL8 AND 2NDSTAGE CUCL2-GRAPHITE INTERCALATION COMPOUNDS AS A FUNCTION OF BOTH PRESSURE AND TEMPERATURE, Journal of physics and chemistry of solids, 57(6-8), 1996, pp. 719-723
Citations number
33
Categorie Soggetti
Physics, Condensed Matter",Chemistry
ISSN journal
00223697
Volume
57
Issue
6-8
Year of publication
1996
Pages
719 - 723
Database
ISI
SICI code
0022-3697(1996)57:6-8<719:TCRF2H>2.0.ZU;2-7
Abstract
In this paper we present data for the c-axis resistivity of first stag e CuAl2Cl8 GIC and second stage CuCl2 GIC as functions of pressure, p, (0.0 < p < 1.5 GPa) and of temperature, T, (4 < T < 300 K). We show e vidence of a possible new high-pressure phase above 1.0 GPa for the Cu Al2Cl8 GIC and we show that the CuCl2 GIC is very stable at all pressu res and temperature investigated. We make a comparison with previous r esults on SbCl5 GICs and other chloride intercalation compounds and wi th theories treating the temperature and pressure coefficients of tran sport parameters in layered solids.