THE C-AXIS RESISTIVITY FOR 2 HOPG-BASED, FIRST STAGE CUAL2CL8 AND 2NDSTAGE CUCL2-GRAPHITE INTERCALATION COMPOUNDS AS A FUNCTION OF BOTH PRESSURE AND TEMPERATURE
Oe. Andersson et al., THE C-AXIS RESISTIVITY FOR 2 HOPG-BASED, FIRST STAGE CUAL2CL8 AND 2NDSTAGE CUCL2-GRAPHITE INTERCALATION COMPOUNDS AS A FUNCTION OF BOTH PRESSURE AND TEMPERATURE, Journal of physics and chemistry of solids, 57(6-8), 1996, pp. 719-723
In this paper we present data for the c-axis resistivity of first stag
e CuAl2Cl8 GIC and second stage CuCl2 GIC as functions of pressure, p,
(0.0 < p < 1.5 GPa) and of temperature, T, (4 < T < 300 K). We show e
vidence of a possible new high-pressure phase above 1.0 GPa for the Cu
Al2Cl8 GIC and we show that the CuCl2 GIC is very stable at all pressu
res and temperature investigated. We make a comparison with previous r
esults on SbCl5 GICs and other chloride intercalation compounds and wi
th theories treating the temperature and pressure coefficients of tran
sport parameters in layered solids.