Jm. Alameda et al., EFFECTS OF THE INITIAL-STAGES OF FILM GROWTH ON THE MAGNETIC-ANISOTROPY OF OBLIQUELY-DEPOSITED COBALT THIN-FILMS, Journal of magnetism and magnetic materials, 154(2), 1996, pp. 249-253
We have studied the in-plane magnetic anisotropy in polycrystalline co
balt films, which were obliquely deposited by e-beam evaporation in UH
V at T-s = 300 K. Three film series were studied, with average film th
icknesses t = 15, 45 and 100 nm. For all cases, the incidence angle of
the vapor beam with respect to the surface normal was alpha = 0, 30,
40, 50, 60 and 70 degrees. At normal incidence, the anisotropy and the
coercive fields were found to be H-K = 15-25 Oe, and H-c similar or e
qual to 25 Oe, independent of the film thickness. In all series it has
been observed that, as alpha increases, the easy axis of in-plane ani
sotropy switches from perpendicular to parallel with respect to the in
cidence plane of atoms during film deposition. For t = 15 nm, such a t
ransition occurs at alpha(t) similar or equal to 70 degrees, whereas f
or larger values of t we found that alpha(t), similar or equal to 60 d
egrees. At constant film thicknesses, H-K and H-c increase with increa
sing alpha; the lower the film thickness, the sharper this effect, e.g
. for alpha = 40 degrees, and t = 100, 45 and 15 nm, H-K similar or eq
ual to 15, 30 and 150 Oe, respectively. We analyzed two possible contr
ibutions to this effect: the shape anisotropy and the magnetocrystalli
ne anisotropy (texture). At low film thicknesses the former becomes do
minant. In order to understand the effect of oblique incidence on the
in-plane easy axis location we studied the polar plot of reduced reman
ence m(r) as a function of both the angle alpha (between the surface n
ormal and the vapor beam) and the angle gamma (between the in-plane ap
plied field and the normal to the incidence plane of atoms during depo
sition). The behavior of m(r)(alpha, gamma) for alpha = 10 degrees and
70 degrees is reminiscent of that predicted by the coherent-rotation
Stoner and Wohlfarth model, although fallback processes are observed.
We found that the films tend to be magnetically isotropic for alpha =
60 degrees, whereas they are highly anisotropic for alpha = 10 degrees
.