ELECTROPLATED, HIGH H-C COPT FILMS - DELTA-M MAGNETOOPTICAL MEASUREMENTS

Citation
L. Callegaro et al., ELECTROPLATED, HIGH H-C COPT FILMS - DELTA-M MAGNETOOPTICAL MEASUREMENTS, Journal of magnetism and magnetic materials, 155(1-3), 1996, pp. 190-192
Citations number
16
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
03048853
Volume
155
Issue
1-3
Year of publication
1996
Pages
190 - 192
Database
ISI
SICI code
0304-8853(1996)155:1-3<190:EHHCF->2.0.ZU;2-B
Abstract
Co-rich CoPt and CoPtP alloy thin films were obtained by electrodeposi tion. Addition of a P compound to the electrolyte for CoPt deposition induces P codeposition and improves film hard magnetic properties, rea ching coercive forces up to 5500 Oe, with S = 0.7. To understand the effect of P compound addition, a macroscopic characterization of inter grain interactions in CoPt and CoPtP films of similar composition and structure has been made by the delta M method, using longitudinal Kerr effect as magnetization probe. delta M curves reveal exchange couplin g in CoPt films, while CoPtP films show mainly magnetostatic interacti ons. The creation of single-domain grains with nonmagnetic boundaries is proposed as an explanation for the inhibition of exchange interacti ons in CoPtP films.