DYNAMICS OF SILICON PLUME GENERATED BY LASER-ABLATION AND ITS CHEMICAL-REACTION

Authors
MAKIMURA T MURAKAMI K
Citation
T. Makimura et K. Murakami, DYNAMICS OF SILICON PLUME GENERATED BY LASER-ABLATION AND ITS CHEMICAL-REACTION, Applied surface science, 96-8, 1996, pp. 242-250
Citations number
19
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
96-8
Year of publication
1996
Pages
242 - 250
Database
ISI
SICI code
0169-4332(1996)96-8:<242:DOSPGB>2.0.ZU;2-0
Abstract
Chemical reaction of laser-ablated silicon particles with oxygen gas d iluted with a helium buffer gas is found by means of soft X-ray absorp tion spectroscopy. In order to make dear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-re solved spatial distribution of light emission from the laser-ablated p articles as well as time- and space-resolved emission spectra.